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Mirage-effect-based depth profiling of micromachined silicon structures
, A.B. Bhattacharyya, B.C. Forget, D. Fournier
Published in Elsevier
1998
Volume: 64
   
Issue: 3
Pages: 203 - 207
Abstract
A non-contact, non-destructive technique for the depth profiling of micromachined structures is presented. Based on the mirage or optical-beam deflection method of photothermal spectroscopy, an experimental measurement of a 8 μm step in silicon is given by way of illustration. © 1998 Elsevier Science S.A.
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Published in Elsevier
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